A comparative study on the properties of TiN films prepared by chemical vapor deposition enhanced by r.f. plasma and by electron cyclotron resonance plasma

Effects of deposition parameters on composition, structure, resistivity and step coverage of TiN thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor

Topological properties of folded hyper-star networks

Comments on “A Class of Fault-Tolerant Multiprocessor Networks”

A multi-level multi-phase charge-recycling method for low-power AMLCD column drivers

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