A Brief Introduction to Flusser Media Philosophy

The Idea of Communism.pdf

Electrical characterization of low-k films with nano-pore structure prepared with DMDMOS/O2 precursors

Characteristics of low-k SiOC(–H) films deposited at various substrate temperature by PECVD using DMDMS/O2 precursor

Effect of evaporated copper and aluminum on post-annealed SiOC(–H) films deposited using plasma-enhanced chemical vapor deposition

Ultraviolet irradiation effect on the properties of leakage current and dielectric breakdown of low-dielectric-constant SiOC(H) films using comb capacitor structure

Studies of the factors effecting the preparation of heterogeneous platinum-based catalyst on silica supports

Paper Machine (2001)

Wisdom_Foolishness of Wisdom

Defence of Narcissism