Post on 07-Nov-2020
Supplementary Information for
Metal Nanowire Percolation Micro-Grids Embedded in Elastomer for Stretchable and Transparent Conductors
Sang-Min Park,a Nam-Su Jang,b Sung-Hun Ha,b Kang Hyun Kim,b Dong-Wook Jeong,b
Jeonghyo Kim,c Jaebeom Lee,c Soo Hyung Kima,b and Jong-Man Kim*a,b
a Department of Advanced Circuit Interconnection, Pusan National University, Busan 609-735, Republic of Korea.b Department of Nano Fusion Technology and BK21 Plus Nano Convergence Technology Division, Pusan National University, Busan 609-735, Republic of Korea. *E-mail: jongkim@pusan.ac.kr c Department of Cogno-Mechatronics Engineering, Pusan National University, Busan 609-735, Republic of Korea.
Electronic Supplementary Material (ESI) for Journal of Materials Chemistry C.This journal is © The Royal Society of Chemistry 2015
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ount
Diameter
Dimension
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*unit of x-axis: nm
Length *unit of x-axis: m(b)(a)
Fig. S1 AgNWs synthesized by CuCl2-mediated polyol process. (a) SEM image of the synthesized
AgNWs; scale bar: 100 μm (inset: digital image of AgNW solution for spray-coating), and (b) length
and diameter distribution of the synthesized AgNWs (500 AgNWs measured).
Initial Coating Removal40
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Tran
smitt
ance
, %
Transmittance @ 550 nm
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ansm
ittan
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Wavelength, nm
Initial PDMS After removal process
After AgNW coating
(a) (b)
Fig. S2 Adhesive-tape-assisted contact-removal process. (a) transmittance spectra of flat PDMS
substrate in three different states; initial (bare), AgNW-coated, and contact-removed (inset: digital
images of the flat PDMS substrate in each state on a logo of our institution), and (b) transmittances at
550-nm wavelength of the flat PDMS substrate in each state.
Fig. S3 Sheet resistances of stretchable AgNW micro-grids (a) for different numbers of coating-and-
removal (C/R) cycles and (b) processed with single and multiple C/R processes, and (c) SEM images
of the device processed with a single C/R process (scale bars: 100 µm (left), 10 µm (right)).
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Fig. S4 Normalized electrical resistance in the released state of each cycle under repetitive
stretching/releasing for up to 30 cycles with a maximum strain of 30 %.
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Wavelength, nm
Tran
smitt
ance
, %
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Fig. S5 Transmittance spectra (400 nm to 800 nm) of the fabricated stretchable AgNW micro-grids
with different grid-to-grid distance.
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Resis
tanc
e,
Tensile strain, %
Loading Unloading
Fig. S6 Electrical resistances of the fabricated stretchable AgNW micro-grids in the loading
states under tensile strains of 10 % to 50 % with a step of 10 % and in the corresponding
unloaded states (dot line indicates the initial resistance of the device.).