Multilayer interference coatings - Peopleattwood/sxr2009/...Prof. David Attwood / UC Berkeley EE213...

1Prof. David Attwood / UC Berkeley EE213 & AST210 / Spring 2009 05_Multilayers_2009.ppt

Multilayer interference coatings

Scattering by density variations within a

multilayer coating

Scattering of radiation by a sinusoidal

density distribution (atoms or electrons)

Scattering from density variations

Multilayer mirrors satisfy the Bragg condition

An angular scan of a multilayer mirror performs a

Fourier-transform of the density profile

Multilayer mirrors satisfy the Bragg condition

High reflectivity multilayer coatings require

• Refractive index contrast at the interfaces

• Minimal absorption in the low-Z material

• Thin high-Z layer where possible ! ! "#H /("#H + "#L)

• Interfaces which are chemically stable with time

• Minimal interdiffusion at the interfaces

• Minimal interfacial roughness (no crystallite formation

within the layers, no shadowing in the coating process,

surface mobility)

• Thermal stability during illumination

• Chemically stable vacuum interface(e.g., Si02 or capping

layer)

• Uniform coating thickness

Computed reflectivity of a W/C x-ray multilayer mirror

High order reflections from a multilayer coating

Multilayer interface mirrors computational model

www.cxro.LBL.gov

Atomic scattering factors for Silicon (Z = 14)

Atomic scattering factors for Molybdenum

(Z = 42)

Optimized reflectivity with thin “high-Z” layers

A high quality Mo/Si multilayer mirror

Mo/Si multilayer interference coating

Molybdenum as the “scattering layer”

Silicon as the non-absorbing “spacing layer”

Actually an exaggeration, the complex

refractive index

of each material plays a role in the reflection

process

The absorption edge Si-L3 = 99.2 eV

(12.5 nm)

Higher photon energies are absorbed in Si,

lower photon energies (longer wavelengths)

are not.

Typically $ = 13.4 nm or more.

Molybdenum has relatively good scattering

properties in this

photon energy (wavelength) region, with

limited absorption.

High reflectivity, thermally and environmentally robust

multilayer coating for high throughput EUV lithography

Multilayer mirrors have achieved a reflectivity of 70%

Recent progress in multilayer mirrors

Sputtered deposition of a multilayer coating

DC magnetron sputtering is used to reliably deposit multilayer

coatings of predictable center wavelength and excellent uniformity

Buried, trace amounts of iron in a defective

silicon solar cell

Microprobe analysis of contaminated soil

Polarization studies of magnetic materials

Photoemission microscopy for surface science and

characterization

Photoemission spectroscopy reveals characteristic

electron binding energies

Photoemission spectroscopy as a tool

for surface science

Observation of varied chemical states by

photoemission spectromicroscopy

Photoemission microscopy of a AIGaN film – “Monet”

High resolution x-ray diffraction under high

pressure using multilayer coated focusing optics

The Cassegrain telescope

Extreme ultraviolet astronomy

EUV image of the solar corona showing loops near the

solar limb

Dynamics of the solar corona

Extreme ultraviolet (EUV) lithography

Smooth multilayer coatings are required to minimize

wavefront errors in EUV optical systems

Multilayer coatings for the ETS projection optics

approach production specifications

Systematic d-space variations suggest path to further improvements.

(Courtesy of R. Soufli and E. Spiller, LLNL)

Multilayer interference coatings - Peopleattwood/sxr2009/...Prof. David Attwood / UC Berkeley EE213...

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